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TOFWERK

Boulder,  CO 
United States
http://www.TOFWERK.com
  • Booth: 6059

Solutions for AMC Monitoring and Process Gas Analysis

Overview

ClearFab by TOFWERK provides semiconductor solutions for contaminant and process monitoring.  

Real-Time AMC Monitoring Using the ClearFab AMC Monitor

  • Real-time online measurements at pptV limits of detection
  • High mass resolving power for accurate identification
  • Automated switching between reagen ions for quantification of various AMCs including molecular acids, bases, condensables, and VOCs
  • Compact design with flexible inlet configuration for FOUP, mobile, and stationary (multi-port) AMC measurements

ClearFab Process - Sensitive, Real-Time Solution for Monitoring and Control of Critical Semiconductor Applications

  • Robust, real-time monitoring for:
    • Research and development
    • Production environments related to etch, deposition, and lithography processes
  • Plasma diagnostics based on traces of plasma species
  • High dynamic range to monitor abundant and trace compounds
  • Sub-monolayer sensitivity for accurate end-point detection
  • Detection of etch rate changes and fluctuations due to malfunction or instabilities
  • Accurate spectral assignment for complex and rich mass spectra


  Products

  • TOFWERK AMC Monitor
    Monitor known and emerging contaminants from diverse molecular categories, sensitively, accurately, and reliably. TOFWERK AMC Monitors provide robust and simultaneous measurements of multiple AMC categories, with a single solution....

  • ENSURE A CONTAMINATION FREE FAB

    Simultaneous detection of critical AMC categories

    • Acids (corrosives)
    • Bases 
    • Condensables
    • Volatile organics 
    • Part-per-trillion limits of detection 
    • Customizable AMC database 
    • Negligible to no fragmentation measurements for simple identification
    • Mobile, point-of-interest, or multi-port utility.
  • TOFWERK Process Gas Analyzer
    Providing sensitive, real-time analysis of semiconductor process gases for R&D and production environments in etch, deposition, and lithography processes....

  • ClearFab Process Solutions are fully integrated process characterization and monitoring systems. Using electron ionization time-of-flight mass spectrometry, all precursors, byproducts, and trace species are simultaneously detected to guide immediate process control action and to inform analytics and process intelligence for deposition, etch, and lithography. Uniquely positioned to address challenging process requirements, ClearFab Process Solutions provide fast, non-intrusive detection of process deviations, in real time.
    • Ready for diverse semiconductor applications Reactor health state (RHS) monitoring, end-point detection, plasma diagnostics and process optimization
    • Fast and sensitive mass spectrometric monitoring TOF mass analyzer enables real-time monitoring all process species with isotopic mass resolution at sub-second refresh rates
    • Large dynamic range Simultaneous detection of all precursors, byproducts and trace species in semiconductor processes
    • Robust and mobile Rugged, flexible configuration allows precision in harsh environments and portability for non-invasive detection
    • Long-term stability Accurate and reproducible response
    • Powerful software  Simple control interface with a fully documented API for system integration
    • Background reduction with notch filter technology Attenuate specific abundant species to control mass spectral interferences

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